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Items where Person is "Boudouvis, Andreas G."

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Number of items: 19.

Article

Gakis, Giorgos and Vahlas, Constantin and Vergnes, Hugues and Dourdain, Sandrine and Tison, Yann and Martinez, Hervé and Bour, Jérôme and Ruch, David and Boudouvis, Andreas G. and Caussat, Brigitte and Scheid, Emmanuel. Investigation of the initial deposition steps and the interfacial layer of Atomic Layer Deposited (ALD) Al2O3 on Si. (2019) Applied Surface Science, 492. 245-254. ISSN 0169-4332

Gakis, Giorgos and Vergnes, Hugues and Scheid, Emmanuel and Vahlas, Constantin and Boudouvis, Andreas G. and Caussat, Brigitte. Detailed investigation of the surface mechanisms and their interplay with transport phenomena in alumina atomic layer deposition from TMA and water. (2019) Chemical Engineering Science, 195. 399-412. ISSN 0009-2509

Gakis, Giorgos and Vergnes, Hugues and Cristiano, Filadelfo and Tison, Yann and Vahlas, Constantin and Caussat, Brigitte and Boudouvis, Andreas G. and Scheid, Emmanuel. Ιn situ N2-NH3 plasma pre-treatment of silicon substrate enhances the initial growth and restricts the substrate oxidation during alumina ALD. (2019) Journal of Applied Physics, 126. ISSN 0021-8979

Gakis, Giorgos and Vergnes, Hugues and Scheid, Emmanuel and Vahlas, Constantin and Caussat, Brigitte and Boudouvis, Andreas G.. Computational fluid dynamics simulation of the ALD of alumina from TMA and H2O in a commercial reactor. (2018) Chemical Engineering Research and Design, 132. 795-811. ISSN 0263-8762

Psarellis, George M. and Aviziotis, Ioannis G. and Duguet, Thomas and Vahlas, Constantin and Koronaki, Eleni D. and Boudouvis, Andreas G.. Investigation of reaction mechanisms in the chemical vapor deposition of al from DMEAA. (2018) Chemical Engineering Science, 177. 464-470. ISSN 0009-2509

Aviziotis, Ioannis G. and Duguet, Thomas and Vahlas, Constantin and Boudouvis, Andreas G.. Combined Macro/Nanoscale Investigation of the Chemical Vapor Deposition of Fe from Fe(CO)5. (2017) Advanced Materials Interfaces. 1601185. ISSN 2196-7350

Aviziotis, Ioannis G. and Cheimarios, Nikolaos and Duguet, Thomas and Vahlas, Constantin and Boudouvis, Andreas G.. Multiscale modeling and experimental analysis of chemical vapor deposited aluminum films : Linking reactor operating conditions with roughness evolution. (2016) Chemical Engineering Science, 155. 449-458. ISSN 0009-2509

Aviziotis, Ioannis G. and Duguet, Thomas and Soussi, Khaled and Kokkoris, George and Cheimarios, Nikolaos and Vahlas, Constantin and Boudouvis, Andreas G.. Investigation of the kinetics of the chemical vapor deposition of aluminum from dimethylethylamine alane: experiments and computations. (2015) Physica Status Solidi C, 12 (7). 923-930. ISSN 1610-1642

Aviziotis, Ioannis G. and Cheimarios, Nikolaos and Vahlas, Constantin and Boudouvis, Andreas G.. Experimental and computational investigation of chemical vapor deposition of Cu from Cu amidinate. (2013) Surface and Coatings Technology, 230. 273-278. ISSN 0257-8972

Kokkoris, George and Brault, Pascal and Thomann, Anne-Lise and Caillard, Amaël and Samélor, Diane and Boudouvis, Andreas G. and Vahlas, Constantin. Ballistic and molecular dynamics simulations of aluminum deposition in micro-trenches. (2013) Thin Solid Films, 536. 115-123. ISSN 0040-6090

Xenidou, Theodora C. and Prud’homme, Nathalie and Vahlas, Constantin and Markatos, Nicholas C. and Boudouvis, Andreas G.. Reaction and Transport Interplay in Al MOCVD Investigated Through Experiments and Computational Fluid Dynamic Analysis. (2010) Journal of The Electrochemical Society (JES), 157 (12). 633-641. ISSN 0013-4651

Xenidou, Theodora C. and Prud’homme, Nathalie and Vahlas, Constantin and Markatos, Nicholas C. and Boudouvis, Andreas G.. A comprehensive insight in the MOCVD of aluminum through interaction between reactive transport modeling and targeted growth experiments. (2009) ECS Transactions , 25 (8). 99 -106. ISSN 1938-6737

Xenidou, Theodora C. and Prud’homme, Nathalie and Aloui, Lyacine and Vahlas, Constantin and Markatos, Nicholas C. and Boudouvis, Andreas G.. Shape optimization of a showerhead system for the control of growth uniformity in a MOCVD reactor using CFD-based evolutionary algorithms. (2009) ECS Transactions, 25 (8). 1053-1060. ISSN 1938-6737

Xenidou, Theodora C. and Boudouvis, Andreas G. and Markatos, Nicholas C. and Samélor, Diane and Senocq, François and Prud’homme, Nathalie and Vahlas, Constantin. An experimental and computational analysis of a MOCVD process for the growth of Al films using DMEAA. (2007) Surface and Coatings Technology, 201 (22 - 23). 8868-8872. ISSN 0257-8972

Conference or Workshop Item

Gakis, Giorgos and Vergnes, Hugues and Scheid, Emmanuel and Boudouvis, Andreas G. and Vahlas, Constantin and Caussat, Brigitte. Computational mechanistic investigation of the initial growth of Alumina ALD: Effect of substrate pretreatment on nucleation period reduction. (2018) In: Rafald 2018, 6 November 2018 - 8 November 2018 (Lyon, France).

Gakis, Giorgos and Vergnes, Hugues and Scheid, Emmanuel and Vahlas, Constantin and Caussat, Brigitte and Boudouvis, Andreas G.. Experimental investigation and CFD-based analysis of an ALD reactor depositing alumina from TMA and water. (2017) In: RAFALD 2017, 7 November 2017 - 9 November 2017 (Montpellier, France). (Unpublished)

Gakis, Giorgos and Vergnes, Hugues and Scheid, Emmanuel and Boudouvis, Andreas G. and Vahlas, Constantin and Caussat, Brigitte. Experimental investigation and CFD-based analysis of an ALD reactor depositing alumina from TMA and water. (2017) In: EuroCVD 21 - Baltic ALD 15 Conference, 11 June 2017 - 14 June 2017 (Linköping, Sweden). (Unpublished)

Gakis, Giorgos and Vergnes, Hugues and Scheid, Emmanuel and Vahlas, Constantin and Boudouvis, Andreas G. and Caussat, Brigitte. Alumina ALD from TMA and Water : Unravelling the surface mechanisms and linking transport phenomena with growth uniformity. In: E-MRS, 17 September 2018 - 20 September 2018 (Vasovie, Poland). (Unpublished)

Gakis, Giorgos and Vergnes, Hugues and Scheid, Emmanuel and Boudouvis, Andreas G. and Vahlas, Constantin and Caussat, Brigitte. CFD analysis of an ALD reactor: gaseous species distribution and cycle time. In: Réseau des Acteurs Français de l' Atomic Layer Deposition (RAFALD), 14 November 2016 - 16 November 2016 (Chatou, France). (Unpublished)

This list was generated on Thu Aug 6 16:27:48 2020 CEST.