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Electrophoretic impregnation of porous anodic aluminum oxide film by silica nanoparticles

Fori, Benoit and Taberna, Pierre-Louis and Arurault, Laurent and Bonino, Jean-Pierre and Gazeau, Céline and Bares, Pierre Electrophoretic impregnation of porous anodic aluminum oxide film by silica nanoparticles. (2012) Colloids and Surfaces A: Physicochemical and Engineering Aspects, 415. 187-194. ISSN 0927-7757

(Document in English)

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Official URL: http://dx.doi.org/10.1016/j.colsurfa.2012.09.011


In this paper, it is proposed to study the deposition of nanoparticles by electrophoretic deposition (EPD) inside a porous anodic aluminum oxide film. Despite the presence of a highly resistive barrier layer at the metal-anodic film interface, porous anodic films on AA 1050A were successfully filled by 16-nm, surface modified silica particles. During this study it was shown that both the colloidal suspension conductivity and the applied electric field drive the penetration into the porous film. FEG-SEM observations showed that large (130-nm diameter), linear pores of 10 μm in length can be completely filled in 1 min. These results attest that porous anodic films can be efficiently filled with nanoparticles by EPD despite the presence of the barrier layer.

Item Type:Article
Additional Information:Thanks to Elsevier editor. The definitive version is available at http://www.sciencedirect.com The original PDF of the article can be found at Colloids and Surfaces A: Physicochemical and Engineering Aspects website : http://dx.doi.org/10.1016/j.colsurfa.2012.09.011
HAL Id:hal-03528860
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Other partners > MÉCAPROTEC Industries (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
Laboratory name:
Deposited On:18 Jun 2013 14:32

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