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Low Temperature Silicon Oxide Deposition on Polymer Powders in a Fluidized Bed Coupled to a Cold Remote Plasma

Caquineau, Hubert and Aiche, Lynda and Vergnes, Hugues and Despax, Bernard and Caussat, Brigitte Low Temperature Silicon Oxide Deposition on Polymer Powders in a Fluidized Bed Coupled to a Cold Remote Plasma. (2012) Surface and Coatings Technology, 206 (23). 4814-4821. ISSN 0257-8972

(Document in English)

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Official URL: http://dx.doi.org/10.1016/j.surfcoat.2012.04.091


In this work silicon oxide has been deposited from silane on fluidized polyethylene powders placed in far cold remote nitrogen/oxygen plasma. The process temperature remained below 100°C. The influence on the powder wettability of several key parameters such as the amount of oxygen injected in the plasma, the SiH4 flow rate and the treatment duration has been studied. From hydrophobic, the polyethylene powder wettability can be drastically improved depending on process conditions. Based on surface analyses of treated powders under various processing conditions, a deposition mechanism has been proposed combining homogeneous and heterogeneous nucleation and growth phenomena. The observed wettability variations appear to be linked to the surface coverage of the powder by the deposit.

Item Type:Article
Additional Information:Thanks to Elsevier editor. The definitive version is available at http://www.sciencedirect.com The original PDF of the article can be found at Surface and Coatings Technology website: http://www.sciencedirect.com/science/article/pii/S0257897212003854
HAL Id:hal-03468980
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
Laboratory name:
PRES Toulouse
Deposited On:04 Sep 2012 10:15

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