OATAO - Open Archive Toulouse Archive Ouverte Open Access Week

Modeling of Silicon CVD into Agglomerates of Sub-micrometersize Particles in a Fluidized Bed

Reuge, Nicolas and Caussat, Brigitte Modeling of Silicon CVD into Agglomerates of Sub-micrometersize Particles in a Fluidized Bed. (2011) Chemical Vapor Deposition, 17 (10-12). 305-311. ISSN 0948-1907

(Document in English)

PDF (Publisher's version) - Requires a PDF viewer such as GSview, Xpdf or Adobe Acrobat Reader

Official URL: http://dx.doi.org/doi:10.1002/cvde.201106888


The aim of the present study is to better understand the mechanisms involved during silicon deposition from silane, SiH4, into agglomerates of sub-micrometer-size particles treated by fluidized bed (FB)CVD. Two models of silicon deposition into agglomerates assumed either stable, or in permanent formation/desegregation, are developed. In the first case, classical equations of diffusion/reaction in a porous medium are solved, whereas in the second case, the multifluid Eulerian code, MFIX, is used. By comparison with experimental energy dispersive X-ray (EDX) data, modeling results show that the limiting step is not gaseous diffusion into the agglomerates. Very high local deposition rates near the silane entrance probably explain their formation. These results allow us to propose original deposition conditions involving much lower local deposition rates, which should limit agglomeration due to CVD.

Item Type:Article
Additional Information:Thanks to Wiley-VCH Verlag Berlin editor. The definitive version of this article is available at :http://dx.doi.org/doi:10.1002/cvde.201106888
HAL Id:hal-03472127
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
Laboratory name:
Laboratoire de Génie Chimique - LGC (Toulouse, France) - Génie des Interfaces & Milieux Divisés (GIMD) - CVD
Deposited On:26 Mar 2012 09:06

Repository Staff Only: item control page