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Fluidization and coating of very dense powders by Fluidized Bed CVD

Rodriguez, Philippe and Caussat, Brigitte and Ablitzer, Carine and Iltis, Xavière and Brothier, Méryl Fluidization and coating of very dense powders by Fluidized Bed CVD. (2011) In: Congrès de la société française de génie des procédés, 29 November 2011 - 1 December 2011 (Lille, France).

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The feasibility of fluidizing very dense powders has been studied in a collaborative work between the French Alternative Energies and Atomic Energy Commission and the Laboratoire de Génie Chimique from INP Toulouse. For this work, a commercial tungsten powder, 75 μm in mean volume diameter and 19,300 kg/m3 in grain density, was used. First, the fluidization of the tungsten powder has been attempted at room temperature using nitrogen or argon as carrier gas. Then, the fluidization was studied at 400 °C in order to investigate the subsequent coating of tungsten powder by Fluidized Bed Chemical Vapour Deposition (FBCVD). In particular, the influence of the H0/D ratio (initial fixed bed height to reactor diameter) on the bed thermal behaviour was analysed. Finally, the first results concerning the coating of tungsten powder by alumina FBCVD from aluminium acetylacetonate are detailed. These latter tend to show that FBCVD is a suitable process to uniformly coat so dense particles.

Item Type:Conference or Workshop Item (Paper)
Additional Information:This paper is published by : Paris : Ed. SFGP, 2011 (Series "Récents progrès en Génie des Procédés", n°101 ; ISSN 1775-335X). - ISBN 2-910239-75-6
HAL Id:hal-04104600
Audience (conference):National conference proceedings
Uncontrolled Keywords:
Institution:French research institutions > Commissariat à l'Energie Atomique et aux énergies alternatives - CEA (FRANCE)
French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
Laboratory name:
Laboratoire de Génie Chimique - LGC (Toulouse, France) - Génie des Interfaces & Milieux Divisés (GIMD) - CVD
Deposited On:06 Dec 2011 12:46

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