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Local Kinetic Modeling of Aluminum Oxide Metal-Organic CVD From Aluminum Tri-isopropoxide

Vergnes, Hugues and Samélor, Diane and Gleizes, Alain and Vahlas, Constantin and Caussat, Brigitte Local Kinetic Modeling of Aluminum Oxide Metal-Organic CVD From Aluminum Tri-isopropoxide. (2011) Chemical Vapor Deposition, 17 (7-9). 181-185. ISSN 0948-1907

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Official URL: http://dx.doi.org/10.1002/cvde.201004301


Due to numerous allotropic modifications and to the subsequent large spectrum of structure-properties relationships,aluminum oxides in the form of films and coatings are of major technological interest for a wide range of applications, e.g., optics and microelectronic components,wear resistance, catalyst support, protection against corrosion,and high temperature oxidation. Metal-organic(MO)CVD is a potentially attractive technique for the processing of such coatings, especially on complex-in-shape, temperature-sensitive parts.

Item Type:Article
Additional Information:Thanks to John Wiley & Sons editor. The definitive version is available at http://onlinelibrary.wiley.com/doi/10.1002/cvde.201004301/abstract
HAL Id:hal-04289171
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
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Deposited On:04 Nov 2011 15:35

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