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Chemical vapor deposition of iron, iron carbides, and iron nitride films from amidinate precursors

Krisyuk, Vladislav V. and Gleizes, Alain and Aloui, Lyacine and Turgambaeva, Asiya E. and Sarapata, Bartosz and Prud’homme, Nathalie and Senocq, François and Samélor, Diane and Zielinska-Lipiec, Anna and De Caro, Dominique and Vahlas, Constantin Chemical vapor deposition of iron, iron carbides, and iron nitride films from amidinate precursors. (2010) Journal of The Electrochemical Society (JES), 157 (8). D454-D461. ISSN 0013-4651

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Official URL: http://dx.doi.org/10.1149/1.3430105


Iron bis(N,N-diisopropylacetamidinate) [Fe2(µ-iPr-MeAMD)2(2-iPr-MeAMD)2] and iron bis(N,N-di-tert-butylacetamidinate) [Fe(tBu-MeAMD)2] were used as precursors for the metallorganic chemical vapor deposition (MOCVD) of iron-containing compounds including pure iron, iron carbides, Fe3C and Fe4C, and iron nitrides Fe4C. Their decomposition mechanism involves hydrogen migration followed by dissociation of the Fe–N bond and the release of free hydrogenated ligand (HL) and radicals. Surface intermediates are either released or decomposed on the surface providing Fe–N or Fe–C bonds. MOCVD experiments were run at 10 Torr, in the temperature ranges of 350–450°C with Fe2(µ−iPr-MeAMD)2(2-iPr-MeAMD)2 and 280–350°C with Fe(tBu-MeAMD)2. Films prepared from Fe2(µ−iPr-MeAMD)2(2-iPr-MeAMD)2 contain Fe, Fe3C, and Fe4C. Those prepared from Fe(tBu-MeAMD)2 contain Fe, Fe3C, and also Fe4C or Fe4N, depending on the temperature and hydrogen to precursor ratio (H/P) in the input gas. The room-temperature coercive field of films processed from Fe(tBu-MeAMD)2 is 3 times higher than that of the high temperature processed Fe4N films.

Item Type:Article
Additional Information:Thanks to Electrochemical Society editor. The definitive version is available at http://www.electrochem.org/ The original PDF of the article can be found at Journal of The Electrochemical Society website : http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JESOAN00015700000800D454000001&idtype=cvips&gifs=yes
HAL Id:hal-03551053
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:Other partners > AGH University of Science and Technology - AGH-UST (POLAND)
French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Other partners > Siberian Branch of the Russian Academy of Sciences - SB RAS (RUSSIA)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
Laboratory name:
Deposited On:17 May 2011 11:49

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