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Fluidized-Bed MOCVD of Bi2O3 Thin Films from Bismuth Triphenyl under Atmospheric Pressure

Reuge, Nicolas and Dexpert-Ghys, Jeannette and Caussat, Brigitte Fluidized-Bed MOCVD of Bi2O3 Thin Films from Bismuth Triphenyl under Atmospheric Pressure. (2010) Chemical Vapor Deposition, 1 (4-6). 123-126. ISSN 0948-1907 (Unpublished)

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Official URL: http://dx.doi.org/10.1002/cvde.200904280


Bismuth oxide thin films are of great interest due to their significant band gap, high refractive index, and dielectric permittivity, as well as marked photoconductivity and photoluminescence.[1] These properties make Bi2O3 films well suited for many applications such as microelectronics,[2] sensor technology,[3] optical coatings,[4] and ceramic glass manufacturing.[5] In this work, we report the synthesis of Bi2O3 films on alumina particles using fluidized bed (FB) CVD under atmospheric pressure. Bismuth triphenyl (Bi(Ph)3) was used as a metal-organic (MO) CVD precursor.

Item Type:Article
Additional Information:The definitive version is available at http://onlinelibrary.wiley.com/doi/10.1002/cvde.200904280/abstract
HAL Id:hal-04288939
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Université de Toulouse > Ecole nationale supérieure des Mines d'Albi-Carmaux - IMT Mines Albi (FRANCE)
Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Université de Toulouse > Institut National des Sciences Appliquées de Toulouse - INSA (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
Laboratory name:
French Agence Nationale de la Recherche - Réseau National Matériaux et Procédés (ANR RNMP05-PRONANOX) - Midi-Pyrénées Regional Council
Deposited On:21 Oct 2010 07:24

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