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Effect of H2 on the microstructure and properties of TiO2 films grown by atmospheric pressure MOCVD on steel substrates

Duminica, Florin-Daniel and Maury, Francis and Hausbrand, R. Effect of H2 on the microstructure and properties of TiO2 films grown by atmospheric pressure MOCVD on steel substrates. (2009) ECS Transactions, 25 (8). 249-256. ISSN 1938-6737

(Document in English)

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Official URL: http://dx.doi.org/10.1149/1.3207598


TiO2 thin films were deposited under atmospheric pressure by MOCVD in the range 400-600 °C on various steel substrates under hydrogen ambiance. It is unusual to study the growth of functional oxide layers under H2 partial pressure, i.e. a reactive gas generally used as reductive atmosphere in CVD. Titanium tetra-isopropoxide was used as single source precursor of Ti and O. The growth rate of TiO2 layers grown under nitrogen increases with the temperature and reaches a maximum in the range 500-550 °C. At these temperatures the diffusion of substrate ions enhances the formation of rutile leading to a lower UV photocatalytic activity. Addition of H2 in the input gas phase during the deposition (i) reduces the formation of interface oxide layer, (ii) prevents the diffusion of cations from the steel substrate toward the TiO2 layer and (iii) favors the growth of anatase. This leads to an increase of photocatalytic efficiency under UV irradiation.

Item Type:Article
Additional Information:Thanks to The Electrochemical Society editor. The definitive version is available at http://www.electrochem.org/ The original PDF of the article can be found at ECS Transactions website : http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=ECSTF8000025000008000249000001&idtype=cvips&gifs=yes&ref=no This paper was selected for the 216th ECS Meeting MA2009-02, October 4 - October 9, 2009 , Vienna, Austria
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Other partners > Arcelor Mittal Research (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Laboratory name:
Deposited On:21 Feb 2011 17:10

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