OATAO - Open Archive Toulouse Archive Ouverte Open Access Week

Chemical vapor deposition and characterization of nitrogen doped TiO2 thin films on glass substrates

Sarantopoulos, Christos and Gleizes, Alain and Maury, Francis Chemical vapor deposition and characterization of nitrogen doped TiO2 thin films on glass substrates. (2009) Thin Solid Films, 518 (4). 1299-1303 . ISSN 0040-6090

(Document in English)

PDF (Author's version) - Requires a PDF viewer such as GSview, Xpdf or Adobe Acrobat Reader

Official URL: http://dx.doi.org/10.1016/j.tsf.2009.04.070


Photocatalytically active, N-doped TiO2 thin films were prepared by low pressure metalorganic chemical vapor deposition (MOCVD) using titanium tetra-iso-propoxide (TTIP) as a precursor and NH3 as a reactive doping gas. We present the influence of the growth parameters (temperature, reactive gas phase composition) on the microstructural and physico-chemical characteristics of the films, as deduced from X-ray diffraction (XRD), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), secondary ion mass spectrometry (SIMS) and ultra-violet and visible (UV/Vis) spectroscopy analysis. The N-doping level was controlled by the partial pressure ratio R=[NH3]/[TTIP] at the entrance of the reactor and by the substrate temperature. For R=2200, the N-doped TiO2 layers are transparent and exhibit significant visible light photocatalytic activity (PA) in a narrow growth temperature range (375–400 °C). The optimum N-doping level is approximately 0.8 at.%. However, the PA activity of these N-doped films, under UV light radiation, is lower than that of undoped TiO2 films of comparable thickness.

Item Type:Article
Additional Information:Thanks to Elsevier editor. The definitive version is available at http://www.sciencedirect.com The original PDF of the article can be found at Thin Solid Films website : http://www.sciencedirect.com/science/journal/00406090
HAL Id:hal-00445826
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Laboratory name:
Deposited On:13 Dec 2010 14:43

Repository Staff Only: item control page