Sarantopoulos, Christos and Gleizes, Alain and Maury, Francis Chemical vapor deposition and characterization of nitrogen doped TiO2 thin films on glass substrates. (2009) Thin Solid Films, 518 (4). 1299-1303 . ISSN 0040-6090
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(Document in English)
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Official URL: http://dx.doi.org/10.1016/j.tsf.2009.04.070
Abstract
Photocatalytically active, N-doped TiO2 thin films were prepared by low pressure metalorganic chemical vapor deposition (MOCVD) using titanium tetra-iso-propoxide (TTIP) as a precursor and NH3 as a reactive doping gas. We present the influence of the growth parameters (temperature, reactive gas phase composition) on the microstructural and physico-chemical characteristics of the films, as deduced from X-ray diffraction (XRD), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), secondary ion mass spectrometry (SIMS) and ultra-violet and visible (UV/Vis) spectroscopy analysis. The N-doping level was controlled by the partial pressure ratio R=[NH3]/[TTIP] at the entrance of the reactor and by the substrate temperature. For R=2200, the N-doped TiO2 layers are transparent and exhibit significant visible light photocatalytic activity (PA) in a narrow growth temperature range (375–400 °C). The optimum N-doping level is approximately 0.8 at.%. However, the PA activity of these N-doped films, under UV light radiation, is lower than that of undoped TiO2 films of comparable thickness.
Item Type: | Article |
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Additional Information: | Thanks to Elsevier editor. The definitive version is available at http://www.sciencedirect.com The original PDF of the article can be found at Thin Solid Films website : http://www.sciencedirect.com/science/journal/00406090 |
Audience (journal): | International peer-reviewed journal |
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Institution: | Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE) Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE) French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE) |
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Deposited On: | 13 Dec 2010 14:43 |
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