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DLI-CVD of TiO2–Cu antibacterial thin films: Growth and characterization

Mungkalasiri, Jitti and Bedel, Laurent and Emieux, Fabrice and Dore, Jeanne and Renaud, François N. R. and Maury, Francis DLI-CVD of TiO2–Cu antibacterial thin films: Growth and characterization. (2009) Surface and Coatings Technology, 204 (6-7). 887-892 . ISSN 0257-8972

(Document in English)

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Official URL: http://dx.doi.org/10.1016/j.surfcoat.2009.07.015


TiO2–Cu nanocomposite films were grown by pulsed direct liquid injection chemical vapor deposition (DLICVD) on stainless steel, silicon and glass substrates with the goal to produce bactericidal surfaces. Copper bis (2,2,6,6-tetramethyl-3,5-heptadionate), Cu(TMHD)2, and titanium tetra-iso-propoxide, TTIP, were used as metalorganic precursors. Liquid solutions of these compounds in xylene were injected in a flash vaporization chamber connected to a cold wall MOCVD reactor. The deposition temperature was typically 683 K and the total pressure was 800 Pa. The copper content of the layers was controlled by the mole fraction of Cu (TMHD)2 which was adjusted by the injection parameters (injection frequency and concentration of the starting solution). The chemical, structural and physical characteristics of the films were investigated by XRD, XPS, FEG-SEM and TEM. Copper is incorporated as metal particles with a relatively large size distribution ranging from 20 to 400 nm (with a large majority in 20–100 nm) depending on the copper content of the films. The influence of the growth conditions on the structural features and the antibacterial properties of the thin films are reported and discussed.

Item Type:Article
Additional Information:Thanks to Elsevier editor. The definitive version is available at http://www.sciencedirect.com The original PDF of the article can be found at Surface and Coatings Technology website : http://www.sciencedirect.com/science/journal/02578972
HAL Id:hal-02957909
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:French research institutions > Commissariat à l'Energie Atomique et aux énergies alternatives - CEA (FRANCE)
French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
Other partners > Université Claude Bernard-Lyon I - UCBL (FRANCE)
Other partners > Nosoco.tech (FRANCE)
Laboratory name:
Deposited On:13 Dec 2010 15:06

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