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Fast MTF measurement of CMOS imagers at the chip level using ISO 12233 slanted-edge methodology

Estribeau, Magali and Magnan, Pierre Fast MTF measurement of CMOS imagers at the chip level using ISO 12233 slanted-edge methodology. (2004) In: SPIE Remote Sensing 2004, 13 Sep 2004, Maspalomas, Gran Canarias, Spain .

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Official URL: http://dx.doi.org/doi:10.1117/12.565503


MTF measurement methods for imaging devices usually require the use of an optical system to project the image of the object onto the detector. So, MTF results quality strongly depends on the accuracy of the optical adjustments (alignments, focusing…). Dedicated edge patterns have been implemented at the chip level on a CMOS imager. One of them emulates the target used in the ISO 12233 slanted-edge technique and the others one are inspired by the knife-edge method. This allows to get the MTF data without optical focusing. In order to validate the results, comparisons have been made between MTF measurements using these patterns and results obtained through direct measurements with the transmissive slanted-edge target and sine target.

Item Type:Conference or Workshop Item (Paper)
Additional Information:Copyright 2004 Society of Photo-Optical Instrumentation Engineers. This paper was published in Proceedings of SPIE and is made available as an electronic reprint with permission of SPIE. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple location via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.
Audience (conference):International conference proceedings
Uncontrolled Keywords:
Institution:Université de Toulouse > Institut Supérieur de l'Aéronautique et de l'Espace - ISAE-SUPAERO (FRANCE)
Laboratory name:
Département d'Electronique, Optronique et Signal - DEOS (Toulouse, France) - Conception d’Imageurs Matriciels Intégrés - CIMI
Deposited On:13 May 2008 07:59

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