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Protective Alumina Coatings by Low Temperature Metalorganic Chemical Vapour Deposition

Sovar, Maria-Magdalena and Samélor, Diane and Gleizes, Alain and Alphonse, Pierre and Perisanu, S. and Vahlas, Constantin Protective Alumina Coatings by Low Temperature Metalorganic Chemical Vapour Deposition. (2007) Advanced Materials Research, 23. 245-248. ISSN 1022-6680

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Official URL: http://dx.doi.org/10.4028/www.scientific.net/AMR.23.245


Alumina thin films were processed from aluminium tri-iso-propoxide in a horizontal, with N2 as a carrier gas, occasional addition of water in the gas phase, deposition temperature in the range 350-700°C, total pressure 0.67 kPa (2 kPa when water was used). The films do not diffract X-ray when prepared below 700°C. At 700°C, they start to crystallize as γ-alumina. EDS, EPMA, ERDA, RBS, FTIR and TGA revealed that films prepared in the range 350-415°C, without water in the gas phase, have an overall composition Al2O3-x(OH)2x, with x tending to 0 with increasing temperature. Al2O3 is obtained above 415°C. When water is added in the vapour phase, the film composition is Al2O3, even below 415°C. Coatings deposited in these conditions show promising protection properties.

Item Type:Article
Additional Information:Thanks to Trans Tech Publications editor. The definitive version is available at www.scientific.net The original PDF of the article can be found at Advanced Materials Research website : http://www.ttp.net/1022-6680.html
HAL Id:hal-04501392
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Other partners > University Politechnica of Bucharest (ROMANIA)
Laboratory name:
Deposited On:15 Jun 2009 12:49

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