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Reactivity of Cr(CO)6 in atmospheric pressure CVD processes for the growth of various metallurgical coatings

Douard, Aurélia and Maury, Francis and Jorcin, Jean-Baptiste and Pébère, Nadine and Bonino, Jean-Pierre and Glenat , H. Reactivity of Cr(CO)6 in atmospheric pressure CVD processes for the growth of various metallurgical coatings. (2007) Reviews on Advanced Materials Science, 15 (1). 24-32. ISSN 1605-8127

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Official URL: http://www.ipme.ru/e-journals/RAMS/no_11507/maury.html


Metalorganic precursors allow a significant decrease of the deposition temperature in CVD processes. When they are employed under atmospheric pressure and using direct liquid injection delivery systems, new processes can be developed for the growth of metallurgical coatings. However, even for a single precursor the great variety of reactive gas phase leads to various coatings with different properties. Original nanocrystalline CrCxOy and CrNxOy films were deposited in a laminar flow reactor by MOCVD and DLICVD using Cr(CO)6 as molecular precursor in the temperature range 285-450 °C. Pyrolysis was carried out in different ambient including N2, H2, NH3, THF, and toluene. The influence of the various atmosphere on the composition, structure and, consequently, mechanical properties and corrosion behavior of these coatings is discussed.

Item Type:Article
Additional Information:Thanks to Advanced Study Center Ltd editor. The definitive version is available at http://www.ipme.ru/e-journals/RAMS/ The original PDF of the article can be found at Reviews on Advanced Materials Science website :http://www.ipme.ru/e-journals/RAMS/
HAL Id:hal-03477964
Audience (journal):International peer-reviewed journal
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Institution:Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
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Deposited On:02 Jul 2009 07:45

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