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Silicon chemical vapor deposition on macro and submicron powders in a fluidized bed

Cadoret, Loic and Reuge, Nicolas and Pannala, Sreekanth and Syamlal, Madhava and Rossignol, Cécile and Dexpert-Ghys, Jeannette and Coufort, Carole and Caussat, Brigitte Silicon chemical vapor deposition on macro and submicron powders in a fluidized bed. (2007) In: Science et Technologie des Poudres et Matériaux Frittés STP 2007 , 23 May 2007 - 25 May 2007 (Albi, France).

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Official URL: http://stp2007.enstimac.fr/


Titanium oxide (TiO2) submicron powders have been treated by Chemical Vapor Deposition (CVD) in a vibro fluidized bed in order to deposit silicon layers of nanometer scale on each individual grain from silane (SiH4). Experimental results show that for the conditions tested, the original granular structure of the powders is preserved for 90% of the initial bed weight while the remaining 10% consisted of agglomerates in millimetre range found near the grid of the reactor. A comparison between experimental and modelling results using the MFIX code shows that for Geldart’s group B alumina particles (Al2O3), the model represents both the bed hydrodynamics and silane conversion rates quite well. The future objective is to extend the simulation capability to cohesive submicron powders

Item Type:Conference or Workshop Item (Paper)
HAL Id:hal-04090053
Audience (conference):National conference proceedings
Uncontrolled Keywords:
Institution:Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Other partners > United States Department of Energy (USA)
Laboratory name:
Deposited On:18 Jun 2009 12:58

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