Cadoret, Loic and Reuge, Nicolas
and Pannala, Sreekanth and Syamlal, Madhava and Rossignol, Cécile and Dexpert-Ghys, Jeannette and Coufort, Carole
and Caussat, Brigitte
Silicon chemical vapor deposition on macro and submicron powders in a fluidized bed.
(2007)
In: Science et Technologie des Poudres et Matériaux Frittés STP 2007 , 23-25 May 2007, Albi, France .
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(Document in English)
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Official URL: http://stp2007.enstimac.fr/
Abstract
Titanium oxide (TiO2) submicron powders have been treated by Chemical Vapor Deposition (CVD) in a vibro fluidized bed in order to deposit silicon layers of nanometer scale on each individual grain from silane (SiH4). Experimental results show that for the conditions tested, the original granular structure of the powders is preserved for 90% of the initial bed weight while the remaining 10% consisted of agglomerates in millimetre range found near the grid of the reactor. A comparison between experimental and modelling results using the MFIX code shows that for Geldart’s group B alumina particles (Al2O3), the model represents both the bed hydrodynamics and silane conversion rates quite well. The future objective is to extend the simulation capability to cohesive submicron powders
Item Type: | Conference or Workshop Item (Paper) |
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Audience (conference): | National conference proceedings |
Uncontrolled Keywords: | |
Institution: | Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE) Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE) French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE) Other partners > United States Department of Energy (USA) |
Laboratory name: | Laboratoire de Génie Chimique - LGC (Toulouse, France) - Génie des Interfaces & Milieux Divisés (GIMD) - CVD Centre d'Elaboration de Matériaux et d'Etudes Structurales - CEMES (Toulouse, France) |
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Deposited On: | 18 Jun 2009 12:58 |
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