OATAO - Open Archive Toulouse Archive Ouverte Open Access Week

Investigations on the Diffusion of Oxygen in Nickel at 1000°C by SIMS Analysis

Perusin, Simon and Monceau, Daniel and Andrieu, Eric Investigations on the Diffusion of Oxygen in Nickel at 1000°C by SIMS Analysis. (2005) Journal of The Electrochemical Society (JES), 152 (12). 390-397. ISSN 0013-4651

(Document in English)

PDF (Author's version) - Requires a PDF viewer such as GSview, Xpdf or Adobe Acrobat Reader

Official URL: http://dx.doi.org/10.1149/1.2116787


High-purity polycrystalline nickel foils have been oxidized at 1000°C in laboratory air before being analyzed in secondary ion mass spectrometry to locally measure the oxygen content in solid solution. The values obtained in metallic grains are surprisingly the same before and after the oxidation treatments (between 5 and 10 atom ppm) and they are much lower than the ones predicted from the literature solubility and diffusion coefficient data at 1000°C. It is shown that this discrepancy could have its origins in the purity level of the samples but also in the exclusive oxygen diffusion in nickel grain boundaries. This last assumption is supported by the occurrence of nickel oxide particles on the walls of voids located in grain boundaries.

Item Type:Article
Additional Information:Thanks to Electrochemical Society editor. The definitive version is available at http://scitation.aip.org The original PDF of the article can be found at Journal of The Electrochemical Society website : http://www.ecsdl.org/JES/
HAL Id:hal-03600387
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Laboratory name:
Deposited On:10 Jun 2009 07:25

Repository Staff Only: item control page