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Large temperature range model for theatmospheric pressure chemical vapor deposition ofsilicon dioxide films on thermosensitive substrates

Topka, Konstantina Christina and Chliavoras, George Alexander and Senocq, François and Vergnes, Hugues and Samélor, Diane and Sadowski, Daniel and Vahlas, Constantin and Caussat, Brigitte Large temperature range model for theatmospheric pressure chemical vapor deposition ofsilicon dioxide films on thermosensitive substrates. (2020) Chemical Engineering Research and Design, 161. 146-158. ISSN 0263-8762

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Official URL: https://doi.org/10.1016/j.cherd.2020.07.007

Abstract

tCoating complex surfaces by functional amorphous silica films for new applications includ-ing energy harvesting and health depends on the operating range and robustness of theirdeposition process. In this paper, we propose a new kinetic model for the atmosphericpressure chemical vapor deposition of SiO2films from TEOS/O2/O3valid in the 150−520◦C temperature range, thus allowing for treating thermally sensitive substrates. For this,we revisit reported chemical schemes in Computational Fluid Dynamics simulations con-sidering original experimental data on the deposition rate of SiO2films from a hot-wallreactor. The new model takes into account for the first time a thermal dependency of thedirect formation of SiO2from TEOS and O3and yields excellent agreement in both shapeand value between experimental and calculated local deposition rate profiles. The modelprovides non-measurable information such as local distributions of species concentrationand reaction rates, which are valuable for developing optimized CVD reactor designs. Origi-nal solutions for the introduction of the reactants are proposed, to uniformly coat complexand/or large parts at a wide temperature range.

Item Type:Article
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
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Deposited On:17 Sep 2020 13:20

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