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MOCVD-Fabricated TiO2 Thin Films: Influence of Growth Conditions on Fibroblast Cells Culture

Popescu, Simona and Demetrescu, Ioana and Mitran, V. and Gleizes, Alain MOCVD-Fabricated TiO2 Thin Films: Influence of Growth Conditions on Fibroblast Cells Culture. (2008) Molecular Crystals and Liquid Crystals, 483. 266-274. ISSN 1542-1406

(Document in English)

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Official URL: http://dx.doi.org/10.1080/15421400801914301


TiO2 thin films with various morphologies were grown on Ti substrates by the LP-MOCVD technique (Low Pressure Chemical Vapour Deposition from Metal-Organic precursor), with titanium tetra-iso-propoxide as a precursor. All the films were prepared in the same conditions except the deposition time. They were characterized by X-ray diffraction, scanning electron microscopy, optical 15 interferometry, water contact angle measurements. MOCVD-fabricated TiO2 thin films are known to be adapted to cell culture for implant requirements. Human gingival fibroblasts were cultured on the various TiO2 deposits. Differences in cell viability (MTT tests) and cell spreading (qualitative assessment) were observed and related to film roughness, wettability and allotropic composition.

Item Type:Article
Additional Information:Thanks to Taylor & Francis editor. The definitive version is available at http://www.informaworld.com The original PDF of the article can be found at Molecular Crystals and Liquid Crystals website : http://www.tandf.co.uk/journals/titles/1058725x.html
HAL Id:hal-03578423
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Other partners > University of Bucharest (ROMANIA)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
Other partners > University Politechnica of Bucharest (ROMANIA)
French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Laboratory name:
Deposited On:29 May 2009 09:52

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