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Chemical vapor deposition of Cu films from copper(I) cyclopentadienyl triethylphophine: Precursor characteristics and interplay between growth parameters and films morphology

Prud'homme, Nathalie and Constantoudis, Vassilios and Turgambaeva, Asiya E. and Krisyuk, Vladislav V. and Samélor, Diane and Senocq, François and Vahlas, Constantin Chemical vapor deposition of Cu films from copper(I) cyclopentadienyl triethylphophine: Precursor characteristics and interplay between growth parameters and films morphology. (2020) Thin Solid Films, 701. 137967. ISSN 0040-6090

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Official URL: https://doi.org/10.1016/j.tsf.2020.137967

Abstract

The rough, even discontinuous morphology of vapor-deposited copper films inhibits their attractive electrical properties. In the present study, we investigate the influence of deposition time, deposition temperature, and the flow rate of the precursors on the morphology of Cu films deposited from metalorganic chemical vapor deposition. We show that it is necessary to purify the copper(I) cyclopentadienyl triethylphophine (CpCuPEt3) precursor in order to improve its stability and volatility. We also determined its saturated vapor pressure law, logPsat (Pa) = 8.614 - 2272/T (K). The Arrhenius plot of the global deposition reaction of Cu films in the presence of hydrogen between 431 and 523 K shows a low apparent activation energy of 10 kJ/mol. Electron probe microanalysis, grazing incidence X-Ray diffraction, and image analysis of the micrographs obtained by top–down surface scanning electron microscopy reveal metallic films composed of Cu islands. Their size and packed density increase and, ultimately, the islands coalesce with increasing precursor flow rate and, to a lesser extent, with increasing deposition temperature.

Item Type:Article
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Other partners > National Center for Scientific Research Demokritos - NCSR Demokritos (GREECE)
Other partners > Nikolaev Institute of Inorganic Chemistry - NIIC SB RAS (RUSSIA)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
Other partners > Nanometrisis (GREECE)
Laboratory name:
Funders:
CNRS - RFBR
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Deposited On:11 Jun 2020 09:20

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