Fondard, Jérémie and Bertrand, Pierre and Billard, Alain and Skrabs, Stefan and Franco, Thomas and Fourcade, Sébastien and Batocchi, Pierre and Mauvy, Fabrice and Bertrand, Ghislaine and Briois, Pascal
Evaluation of a Metal Supported Ni-YSZ / YSZ / La2NiO4 IT-SOFC Elaborated by Physical Surface Deposition Processes.
(2015)
ECS Transactions, 68 (1). 2303-2316. ISSN 1938-6737
|
(Document in English)
PDF (Author's version) - Requires a PDF viewer such as GSview, Xpdf or Adobe Acrobat Reader 1MB |
Official URL: https://doi.org/10.1149/06801.2303ecst
Abstract
The elaboration of the last generation metal supported IT-SOFC complete cell by dry surface deposition processes is really challenging. Atmospheric Plasma Spraying (APS) and Reactive Magnetron Sputtering (RMS) processes are respectively adapted to deposit Ni-YSZ anode and YSZ electrolyte layers. RMS is also used to coat a thin and dense La2NiO4 (LNO) cathode layer. In this work, we have elaborated a complete cell on metallic support(ITM) produced by PLANSEE SE. The innovative LNO cathode layer was compared with screen-printed LNO layers, with and without RMS bonding layer. Electrochemical and Voltametry testswere performed on these samples. These revealed lower performances than literature due to the high density of the RMS cathode layer, and too high a temperature during sintering step which deteriorate layers manufactured by RMS and metallic substrate. Nevertheless, using LNO bonding layer manufactured by RMS seems to be an interesting way to improve the polarization resistance of the cell.
Repository Staff Only: item control page