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Field electron emission of double walled carbon nanotube film prepared by drop casting method

Somani, Prakash R. and Somani, Savita P. and Lau, Shu Ping and Flahaut, Emmanuel and Tanemura, Masaki and Umeno, Masayoshi Field electron emission of double walled carbon nanotube film prepared by drop casting method. (2007) Solid-State Electronics, 51 (5). 788-792. ISSN 0038-1101

(Document in English)

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Official URL: http://dx.doi.org/10.1016/j.sse.2007.02.041


Thick films of double walled carbon nanotubes (DWCN) were deposited on indium-tin-oxide (ITO) coated glass substrates by drop casting method and were studied for their field electron emission property in a parallel plate configuration using bare ITO coated glass as counter electrode. They show excellent field electron emission property with low turn-on-field of about 0.8 V/lm and threshold field of about 1.8 V/lm. Field enhancement factor calculated from the non-saturated region of the FN plot is about 1715. Field electron emission current was observed to be stable up to 3000 min, indicating thereby that DWCNs are excellent electron emitters with appreciable stable performance.

Item Type:Article
Additional Information:Thanks to Elsevier editor. The definitive version is available at http://www.sciencedirect.com The original PDF of the article can be found at Solid-State Electronics website : http://www.sciencedirect.com/science/journal/00381101
HAL Id:hal-00808916
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:Other partners > Chubu University (JAPAN)
Other partners > Nanyang Technological University - NTU (REPUBLIC OF SINGAPORE)
Other partners > Nagoya Institute of Technology - NIT (JAPAN)
Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Laboratory name:
Deposited On:05 Jun 2009 15:01

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