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In Recognition of Professor Hitchman: Advances in Chemical Vapor Deposition

Maury, Francis and Alexandrov, Sergey and Barreca, Davide and Davazoglou, Dimitris and Pemble, Martyn In Recognition of Professor Hitchman: Advances in Chemical Vapor Deposition. (2017) Advanced Materials Interfaces, 4 (18). 1700984. ISSN 2196-7350

(Document in English)

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Official URL: https://doi.org/10.1002/admi.201700984


Chemical vapor deposition (CVD) processes had been around for nearly 100 years before they began to attract interest from materials scientists and electronics engineers in the 60s and 70s, as a result of the rapidly growing microelectronics industry. The successful development of this complicated technology required a deep physicochemical understanding of deposition processes and reaction mechanisms. This resulted in a large number of scientists from different disciplines studying the basics of CVD.

Item Type:Article
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
Laboratory name:
Deposited On:18 Dec 2019 10:09

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