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N-doped TiO2 coatings grown by atmospheric pressure MOCVD for visible light-induced photocatalytic activity

Duminica, Florin-Daniel and Maury, Francis and Hausbrand, R. N-doped TiO2 coatings grown by atmospheric pressure MOCVD for visible light-induced photocatalytic activity. (2007) Surface and Coatings Technology, 201 (22 - 23). 9349-9353. ISSN 0257-8972

(Document in English)

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Official URL: http://dx.doi.org/10.1016/j.surfcoat.2007.04.061


N-doped TiO2 films were deposited by atmospheric pressure CVD from titanium tetra-isopropoxide (TTIP) and N2H4 as reactive gas in the temperature range 400–500 °C on various substrates. The films grown at 400 °C are amorphous and exhibit a compact structure and a smooth surface morphology. Increasing the deposition temperature first leads to the crystallization in the anatase structure (temperature range 410–450 °C) and then to the formation of rutile, so that an anatase-rutile mixture is observed in the temperature range 450–500 °C. Correlation between the structure, the morphology, optical properties, hydrophilicity and photocatalytic activity of the thin films both under UVand VIS light are presented and discussed in relation with deposition conditions.

Item Type:Article
Additional Information:Thanks to Elsevier editor. The definitive version is available at http://www.sciencedirect.com The original PDF of the article can be found at Surface and Coatings Technology website : http://www.sciencedirect.com/science/journal/02578972
HAL Id:hal-00806210
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Other partners > Arcelor Mittal Research (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Laboratory name:
Deposited On:06 May 2009 12:47

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