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Hydrogen sulphide quantification by SIFT/MS: highlighting the influence of gas moisture

Vitola Pasetto, Leticia and Richard, Romain and Pic, Jean-Stéphane and Manero, Marie-Hélène and Violleau, Frédéric and Simon, Valérie Hydrogen sulphide quantification by SIFT/MS: highlighting the influence of gas moisture. (2019) International Journal of Environmental Analytical Chemistry. ISSN 0306-7319

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Official URL: https://doi.org/10.1080/03067319.2019.1650919


The quantification of hydrogen sulphide (H2S) by Selected Ion Flow Tube coupled with Mass Spectrometry (SIFT/MS) was investigated for application in industrial emission context, usually faced with concentrations of water vapour higher than the saturation at room condition. H2S concentrations measured by SIFT/MS (using nitrogen as carrier gas and flow tube temperature at 119°C) were affected by water content, reducing the sensibility for H2S measurements. Accurate concentrations were obtained when the influence of water was considered on SIFT/MS analysis, requiring although the information about water content in the sample. In addition, the association of low concentration of H2S (around 50 ppbv) and high humidity level (4.0 %vol of water) was highlighted as a critical point for measuring H2S by SIFT/MS, due to the sensibility reduction as function of water content and the measurement uncertainty enhancement at low signal intensity.

Item Type:Article
HAL Id:hal-02278814
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
French research institutions > Institut National de la Recherche Agronomique - INRA (FRANCE)
Université de Toulouse > Institut National des Sciences Appliquées de Toulouse - INSA (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
Laboratory name:
French National Agency for Research
Deposited On:04 Sep 2019 14:13

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