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Electrochemical Behavior of Magnetron-Sputtered Al–Cu Alloy Films in Sulfate Solutions

Idrac, Jonathan and Blanc, Christine and Kihn, Yolande and Lafont, Marie-Christine and Mankowski, Georges and Skeldon, Peter and Thompson, George Electrochemical Behavior of Magnetron-Sputtered Al–Cu Alloy Films in Sulfate Solutions. (2007) Journal of The Electrochemical Society (JES), 154 (6). C286-C293. ISSN 0013-4651

(Document in English)

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Official URL: http://dx.doi.org/10.1149/1.2719623


Model alloys, generated by magnetron sputtering, have been employed to understand the role of copper on the corrosion behavior of aluminum alloys. Binary Al–Cu alloys, with copper contents between 0 and 100 atom %, were synthesized with well-controlled compositions, embracing single-phase alpha and theta alloys together with multiphase alloys. Electrochemical measurements confirmed the stability of the thin alloy films and revealed that the corrosion behavior of the alpha, theta, and eta2 phases differed strongly in the cathodic region. Further, in the anodic region, phases of high copper content suffered pitting in sulfate solutions, while the alpha phase remained passive.

Item Type:Article
Additional Information:Thanks to Electrochemical Society editor. The definitive version is available at http://www.scitation.aip.org The original PDF of the article can be found at Journal of The Electrochemical Society website : http://www.ecsdl.org/JES/
HAL Id:hal-00806052
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:Other partners > University of Manchester (UNITED KINGDOM)
Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Laboratory name:
Deposited On:25 May 2009 07:20

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