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Polyimide (PI) films by chemical vapor deposition (CVD): Novel design, experiments and characterization

Puig-Pey González, Jaime and Lamure, Alain and Senocq, François Polyimide (PI) films by chemical vapor deposition (CVD): Novel design, experiments and characterization. (2007) Surface and Coatings Technology, 201 (22 - 23). 9437-9441. ISSN 0257-8972

(Document in English)

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Official URL: http://dx.doi.org/10.1016/j.surfcoat.2007.05.029


Polyimide (PI) has been deposited by chemical vapor deposition (CVD) under vacuum over the past 20 years. In the early nineties, studies, experiences and characterization were mostly studied as depositions from the co-evaporation of the dianhydride and diamine monomers. Later on, several studies about its different applications due to its interesting mechanical and electrical properties enhanced its development. Nowadays, not many researches around PI deposition are being carried. This paper presents a PI film deposition research project with an original CVD process design. The deposition is performed under ambient conditions (atmospheric pressure) through a gas flux vector. Design of apparatus, deposition conditions and preliminary characterizations (IR, SEM and surface analyses) are discussed.

Item Type:Article
Additional Information:Thanks to Elsevier editor. The definitive version is available at http://www.sciencedirect.com The original PDF of the article can be found at Surface and Coatings Technology website : http://www.sciencedirect.com/science/journal/02578972
HAL Id:hal-00806001
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Laboratory name:
Deposited On:04 May 2009 13:27

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