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Multifluid eulerian modelling of a silicon fluidized bed chemical vapor deposition process : analysis of various kinetic models

Reuge, Nicolas and Cadoret, Loic and Caussat, Brigitte Multifluid eulerian modelling of a silicon fluidized bed chemical vapor deposition process : analysis of various kinetic models. (2009) Chemical Engineering Journal, 148 (2-3). 506-516. ISSN 1385-8947

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Official URL: http://dx.doi.org/10.1016/j.cej.2008.12.017


Using the multifluid Eulerian code MFIX, the silicon Fluidized Bed Chemical Vapor Deposition process from silane (SiH4) has been modelled under transient conditions. In order to constitute an experimental database, a preliminary experimental study has been performed using a bed of Geldart’s group B particles. After a detailed analysis and comparison of the kinetic models available in the literature, four of them have been implemented in the MFIX code and two hydrodynamic models have been tested. 3-D simulations have shown that a strong interaction exists between the bed hydrodynamics, heat and reactive mass transfers and that Si deposition from silane mainly occurs in the dense zones of the bed whereas the unsaturated species silylene (SiH2) forms in bubbles and slugs and leads to Si deposition mainly at their periphery; its contribution to deposition can be locally as high as that of SiH4. The average contribution of SiH2 to deposition increases with the inlet concentration of silane and can reach 30%. The kinetic models derived from the law of Furusawa et al. and from the data compiled by Buss et al. and the hydrodynamic model based on the true granular energy equation and the Princeton solid phase stress model have revealed to be the most appropriate ones for the conditions tested.

Item Type:Article
Additional Information:Thanks to Elsevier editor. The definitive version is available at http://www.sciencedirect.com The original PDF of the article can be found at Chemical Engineering Journal website : http://www.sciencedirect.com/science/journal/13858947
HAL Id:hal-00464451
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Laboratory name:
Laboratoire de Génie Chimique - LGC (Toulouse, France) - Génie des Interfaces & Milieux Divisés (GIMD) - CVD
Deposited On:24 Apr 2009 12:41

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