OATAO - Open Archive Toulouse Archive Ouverte Open Access Week

Chromium carbide growth by direct liquid injection chemical vapor deposition in long and narrow tubes, experiments, modeling and simulation

Michau, Alexandre and Maury, Francis and Schuster, Frédéric and Nuta, Ioana and Gazal, Yoan and Boichot, Raphaël and Pons, Michel Chromium carbide growth by direct liquid injection chemical vapor deposition in long and narrow tubes, experiments, modeling and simulation. (2018) Coatings, 8 (6). 220/1-220/19. ISSN 2079-6412

(Document in English)

PDF (Publisher's version) - Requires a PDF viewer such as GSview, Xpdf or Adobe Acrobat Reader

Official URL: http://doi.org/10.3390/coatings8060220


Chromium carbide layers were deposited using liquid-injection metal-organic chemical vapor deposition inside long (0.3 to 1 m) and narrow (8 to 24 mm in diameter) metallic tubes. The deposition was carried out using a molecular single-source, bis(benzene)chromium (BBC), as representative of the bis(arene)metal family diluted in toluene and injected with N2 as carrier gas. A multicomponent mass transport model for the simulation of the coupled fluid flow, heat transfer and chemistry was built. The kinetic mechanism of the growth of CrCx films was developed with the help of large-scale experiments to study the depletion of the precursors along the inner wall of the tube. The model fits well in the 400–550 !C temperature range and in the 1.3 ⇥ 102 to 7 ⇥ 103 Pa pressure range. The pressure is shown to have a pronounced effect on the deposition rate and thickness uniformity of the resulting coating. Below 525 !C the structure, composition and morphology of the films are not affected by changes of total pressure or deposition temperature. The coatings are amorphous and their Cr:C ratio is about 2:1, i.e., intermediate between Cr7C3 and Cr3C2. Themodelwas applied to the design of a long reactor (1 m), with a double injection successively and alternatively undertaken at each end to ensure the best uniformity with sufficient thickness. This innovative concept can be used to optimize industrial deposition processes inside long and narrow tubes and channels.

Item Type:Article
HAL Id:hal-01829650
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:French research institutions > Commissariat à l'Energie Atomique et aux énergies alternatives - CEA (FRANCE)
French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Other partners > Institut polytechnique de Grenoble (FRANCE)
Other partners > Université Grenoble Alpes - UGA (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
Laboratory name:
Deposited On:04 Jul 2018 09:20

Repository Staff Only: item control page