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Thermoelectric and transport properties of Delafossite CuCrO2:Mg thin films prepared by RF magnetron sputtering

Sinnarasa, Inthuga and Thimont, Yohann and Presmanes, Lionel and Tailhades, Philippe Thermoelectric and transport properties of Delafossite CuCrO2:Mg thin films prepared by RF magnetron sputtering. (2017) Nanomaterials, 7 ( 157). 1-16. ISSN 2079-4991

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Official URL: http://dx.doi.org/10.3390/nano7070157


P-type Mg doped CuCrO2 thin films have been deposited on fused silica substrates by Radio-Frequency (RF) magnetron sputtering. The as-deposited CuCrO2:Mg thin films have been annealed at different temperatures (from 450 to 650 ◦C) under primary vacuum to obtain the delafossite phase. The annealed samples exhibit 3R delafossite structure. Electrical conductivity σ and Seebeck coefficient S of all annealed films have been measured from 40 to 220 ◦C. The optimized properties have been obtained for CuCrO2:Mg thin film annealed at 550 ◦C. At a measurement temperature of 40 ◦C, this sample exhibited the highest electrical conductivity of 0.60 S·cm−1 with a Seebeck coefficient of +329 µV·K−1. The calculated power factor (PF = σS 2) was 6 µW·m−1·K−2 at 40 ◦C and due to the constant Seebeck coefficient and the increasing electrical conductivity with measurement temperature, it reached 38 µW·m−1·K−2 at 220 ◦C. Moreover, according to measurement of the Seebeck coefficient and electrical conductivity in temperature, we confirmed that CuCrO2:Mg exhibits hopping conduction and degenerates semiconductor behavior. Carrier concentration, Fermi level, and hole effective mass have been discussed.

Item Type:Article
Additional Information:Thanks to MDPI editor. The original PDF of the article can be found at http://www.mdpi.com/2079-4991/7/7/157
HAL Id:hal-01754780
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
Laboratory name:
Deposited On:30 Mar 2018 08:22

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