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Adaptation of a dry metalorganic chemical vapor deposition (MOCVD) metallization process to a wet chemical pretreatment of polymers

Zhang, Anne and Addou, Fouzi and Duguet, Thomas and Caussé, Nicolas and Vahlas, Constantin Adaptation of a dry metalorganic chemical vapor deposition (MOCVD) metallization process to a wet chemical pretreatment of polymers. (2017) Journal of Vacuum Science and Technology A, 35 (6). 061101-061107. ISSN 0734-2101

(Document in English)

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Official URL: http://dx.doi.org/10.1116/1.4986052


A wet chemical pretreatment is applied on a carbon fiber reinforced polymer composite in order to provide a metalorganic chemical vapor deposition metallization layer with satisfactory adhesion. The pretreatment modifies the surface composition and the surface energy by forming a high concentration of surface polar groups. It also creates a multiscale roughness which results in a nonuniform topography; the etching efficiency being dependent on the considered surface area. Hence, previously underlying C fibers become exposed at the free surface and this modifies the reactivity toward metallization in these surface regions. The adhesion and resistivity of the Cu films are then impacted by such heterogeneity. This is exemplified by the visual inspection of adhesive tapes used for testing adhesion where Cu is exclusively removed at the location of bare C fibers. Addition of water vapor during the first step of the chemical vapor deposition process results in the formation of a copper oxide buffer layer. The latter perfectly wets the entire substrate surface, making the copper layer uniform while preserving adhesion and improving the electrical resistivity.

Item Type:Article
Additional Information:Thanks to American Vacuum Society editor. The definitive version is available at http://avs.scitation.org The original PDF of the article can be found at Journal of Vacuum Science & Technology A website : http://avs.scitation.org/doi/10.1116/1.4986052
HAL Id:hal-01590721
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
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Deposited On:20 Sep 2017 07:51

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