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Sputtered titanium carbide thick film for high areal energy on chip carbon-based micro-supercapacitors

Létiche, Manon and Brousse, Kevin and Demortiere, Arnaud and Huang, Peihua and Daffos, Barbara and Pinaud, Sébastien and Respaud, Marc and Chaudret, Bruno and Roussel, Pascal and Buchaillot, Lionel and Taberna, Pierre-Louis and Simon, Patrice and Lethien, Christophe Sputtered titanium carbide thick film for high areal energy on chip carbon-based micro-supercapacitors. (2017) Advanced Functional Materials, 27 (20). 1-10. ISSN 1616-301X

(Document in English)

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Official URL: http://dx.doi.org/10.1002/adfm.201606813


The areal energy density of on-chip micro-supercapacitors should be improved in order to obtain autonomous smart miniaturized sensors. To reach this goal, high surface capacitance electrode (>100 mF cm−2) has to be produced while keeping low the footprint area. For carbide-derived carbon (CDC) micro-supercapacitors, the properties of the metal carbide precursor have to be fine-tuned to fabricate thick electrodes. The ad-atoms diffusion process and atomic peening effect occurring during the titanium carbide sputtering process are shown to be the key parameters to produce low stress, highly conductive, and thick TiC films. The sputtered TiC at 10−3 mbar exhibits a high stress level, limiting the thickness of the TiC-CDC electrode to 1.5 μm with an areal capacitance that is less than 55 mF cm−2 in aqueous electrolyte. The pressure increase up to 10−2 mbar induces a clear reduction of the stress level while the layer thickness increases without any degradation of the TiC electronic conductivity. The volumetric capacitance of the TiC-CDC electrodes is equal to 350 F cm−3 regardless of the level of pressure. High values of areal capacitance (>100 mF cm−2) are achieved, whereas the TiC layer is relatively thick, which paves the way toward high-performance micro-supercapacitors.

Item Type:Article
Additional Information:Thanks to John Wiley & Sons editor. The original PDF of the article can be found at http://onlinelibrary.wiley.com/doi/10.1002/adfm.201606813/abstract;jsessionid=53A8A796DB12DFCE15CBDB938454C7D3.f02t02
HAL Id:hal-01582136
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Other partners > Ecole Nationale Supérieure de Chimie de Lille - ENSCL (FRANCE)
Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Université de Toulouse > Institut National des Sciences Appliquées de Toulouse - INSA (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
Other partners > Université de Picardie Jules Verne (FRANCE)
Other partners > Ecole Centrale de Lille (FRANCE)
Other partners > Institut Supérieur d’Electronique et du Numérique - ISEN (FRANCE)
Other partners > Université d'Artois (FRANCE)
Other partners > Université Lille 1, Sciences et Technologies - Lille 1 (FRANCE)
Other partners > Université de Valenciennes et du Hainaut-Cambrésis - UVHC (FRANCE)
Laboratory name:
Deposited On:04 Sep 2017 13:15

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