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Flash sintering of dielectric nanoparticles as a percolation phenomenon through a softened film

Chaim, Rachman and Chevallier, Geoffroy and Weibel, Alicia and Estournès, Claude Flash sintering of dielectric nanoparticles as a percolation phenomenon through a softened film. (2017) Journal of Applied Physics, 121 (14). 145103/1-145103/5. ISSN 0021-8979

(Document in English)

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Official URL: http://dx.doi.org/10.1063/1.4980853


Recent work [Biesuz et al., J. Appl. Phys. 120, 145107 (2016)] showed analogies between the flash sintering and dielectric breakdown in α-aluminas pre-sintered to different densities. Here, we show that flash sintering of dielectric nanoparticles can be described as a universal behavior by the percolation model. The electrical system is composed of particles and their contact point resistances, the latter softened first due to preferred local Joule heating and thermal runaway during the flash. Local softening has a hierarchical and invasive nature and propagates between the electrodes. The flash event signals the percolation threshold by invasive nature of the softened layer at the particle surfaces. Rapid densification is associated with local particle rearrangements due to attractive capillary forces induced by the softened film at the particle contacts. Flash sintering is a critical phenomenon with a self-organizing character. The experimental electric conductivity results from flash sintering are in full agreement with those calculated from the percolation model.

Item Type:Article
Additional Information:Thanks to American Institute of Physics editor. The definitive version is available at http://aip.scitation.org/ The original PDF of the article can be found at http://aip.scitation.org/doi/figure/10.1063/1.4980853
HAL Id:hal-01540058
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Other partners > Technion – Israel Institute of Technology (ISRAEL)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
Laboratory name:
Deposited On:15 Jun 2017 14:53

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