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Key Parameters of Pulsed Laser Deposition for Solid Electrolyte Thin Film Growth

Myerlas, Robert Key Parameters of Pulsed Laser Deposition for Solid Electrolyte Thin Film Growth. (2017) International Journal of Advances in Engineering & Technology, 10 (1). 46-51. ISSN 2231-1963

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Official URL: http://www.ijaet.org/media/5I37-IJAET1001126-v10-iss1-pp46-51.pdf

Abstract

The pulsed laser deposition (PLD) technique has been a common method to grow thin films such as solid electrolyte (SE). The effects of substrate temperature and laser fluence on the thin film properties and the device performance are analyzed. For the first time, a quantitative analytical model dealing with the energy conversion in the process when laser hits the target is presented, which provides a solution that is crucial in correlating the formation of high quality and uniform thin films to the experimental design. The migration speed of the ablated particles, which determines the quality of the deposited films, is found to be directly related with the laser fluence. Specifically, a threshold fluence is required to generate high purity single form thin film. This model provides the opportunities to improve experimental design and quality control.

Item Type:Article
Additional Information:Thanks to IJAET editor. The original PDF of the article can be found at : http://www.ijaet.org/media/5I37-IJAET1001126-v10-iss1-pp46-51.pdf
HAL Id:hal-01527177
Audience (journal):International peer-reviewed journal
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Institution:Other partners > University of Montana Western - UMW (USA)
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Deposited On:24 May 2017 07:56

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