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Grayscale Lithography to Fabricate Varying-Depth Nanochannels In A Singe Step

Naillon, Antoine and Massadi, Hajar and Courson, Rémi and Calmon, Pierre-François and Seveno, Lucie and Prat, Marc and Joseph, Pierre Grayscale Lithography to Fabricate Varying-Depth Nanochannels In A Singe Step. (2016) In: The 20th International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS, 9 October 2016 - 13 October 2016 (Dublin, Ireland). (Unpublished)

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Abstract

We report a new, fast and versatile method to fabricate nanochannels with non-uniform depth in a single step, in the range 50-500nm. The process is based on maskless laser lithography to structure a photosensitive resist (PR). The lateral dimension can be as small as 2µm. Functional nanofluidic chips with slopes, steps, and pore networks mimicking a nanoporous medium were fabricated and tested.

Item Type:Conference or Workshop Item (Poster)
Additional Information:Thanks to The 20th International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS - http://www.microtas2016.org/
Audience (conference):International conference without published proceedings
Uncontrolled Keywords:
Institution:French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
Other partners > Kloé SA (FRANCE)
Laboratory name:
Funders:
ANDRA - CNRS - RENATECH network
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Deposited On:29 May 2017 14:56

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