Marín, Lorena and Nanayakkara, Charith E. and Veyan, Jean-Francois and Warot-Fonrose, Bénédicte and Joulié, Sébastien and Estève, Alain and Tenailleau, Christophe and Chabal, Yves J. and Rossi, Carole Enhancing the Reactivity of Al/CuO Nanolaminates by Cu Incorporation at the Interfaces. (2015) ACS Applied Materials and Interfaces, 7 (22). 11713-11718. ISSN 1944-8244
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Official URL: http://dx.doi.org/10.1021/acsami.5b02653
Abstract
In situ deposition of a thin (∼5 nm) layer of copper between Al and CuO layers is shown to increase the overall nanolaminate material reactivity. A combination of transmission electron microscopy imaging, in situ infrared spectroscopy, low energy ion scattering measurements, and first-principles calculations reveals that copper spontaneously diffuses into aluminum layers (substantially less in CuO layers). The formation of an interfacial Al:Cu alloy with melting temperature lower than pure Al metal is responsible for the enhanced reactivity, opening a route to controlling the stochiometry of the aluminum layer and increasing the reactivity of the nanoenergetic multilayer systems in general.
Item Type: | Article |
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Additional Information: | Thanks to ACS editor. The definitive version is available at http://pubs.acs.org |
HAL Id: | hal-01452182 |
Audience (journal): | International peer-reviewed journal |
Uncontrolled Keywords: | |
Institution: | French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE) Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE) Université de Toulouse > Institut National des Sciences Appliquées de Toulouse - INSA (FRANCE) Université de Toulouse > Institut Supérieur de l'Aéronautique et de l'Espace - ISAE-SUPAERO (FRANCE) Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE) Université de Toulouse > Université Toulouse - Jean Jaurès - UT2J (FRANCE) Other partners > University of Texas at Dallas (USA) |
Laboratory name: | |
Funders: | French Technological Network RENATECH - CNRS |
Statistics: | download |
Deposited On: | 01 Feb 2017 15:28 |
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