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Assessment of candidate metallization systems deposited on diamond using nano-indentation and nano-scratching tests

Msolli, Sabeur and Alexis, Joël and Kim, Heung Soo and Dalverny, Olivier and Karama, Moussa Assessment of candidate metallization systems deposited on diamond using nano-indentation and nano-scratching tests. (2016) Thin Solid Films, 619. 53-60. ISSN 0040-6090

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Official URL: http://dx.doi.org/10.1016/j.tsf.2016.10.022

Abstract

Mechanical suitability of ohmic contacts among the select metallization systems, deposited on a p-type heavily boron-doped homoepitaxial diamond layer, was evaluated via mechanical tests on the nanoscale. Two candidate metallization systems were considered: Si/Al and Ti/Pt/Au. Metallizations were performed using two different techniques: plasma-enhanced chemical vapour deposition and “lift-off”. Effectiveness of the techniques was assessed via mechanical tests on the microscale and the nanoscale. Nano-indentation experiments were performed to determine the mechanical properties of the layers. Nano-scratching experiments were used to evaluate the mechanical adhesion on the diamond substrate. Scanning electron microscopy was applied for observation of the morphology of the surface and the indent and for detecting defects.

Item Type:Article
Additional Information:Thanks to Elsevier editor. The definitive version is available at http://www.sciencedirect.com The original PDF of the article can be found at Thin Solid Films website : http://www.sciencedirect.com/science/article/pii/S0040609016306101
HAL Id:hal-01449172
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Other partners > Dongguk University (REPUBLIC OF KOREA)
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Deposited On:12 Dec 2016 13:41

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