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Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties

Baggetto, Loïc and Charvillat, Cédric and Thébault, Yannick and Esvan, Jérôme and Lafont, Marie-Christine and Scheid, Emmanuel and Veith, Gabriel M. and Vahlas, Constantin Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties. (2016) Physica Status Solidi (A): Applications and materials science, 213 (2). 470-480. ISSN 1862-6319

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Official URL: http://dx.doi.org/10.1002/pssa.201532838


Ti/Al2O3 bilayer stacks are used as model systems to investigate the role of atomic layer deposition (ALD) and chemical vapor deposition (CVD) to prepare 30–180 nm thick amorphous alumina films as protective barriers for the medium temperature oxidation (500–600 8C) of titanium, which is employed in aeronautic applications. X-ray diffraction (XRD), transmission electron microscopy (TEM) with selected area electron diffraction (SAED), and X-ray photoelectron spectroscopy (XPS) results show that the films produced from the direct liquid injection (DLI) CVD of aluminum tri-isopropoxide(ATI) are poor oxygen barriers. The films processed using the ALD of trimethylaluminum (TMA) show good barrier properties but an extensive intermixing with Ti which subsequently oxidizes. In contrast, the films prepared from dimethyl aluminum isopropoxide (DMAI) by CVD are excellent oxygen barriers and show little intermixing with Ti. Overall, these measurements correlate the effect of the alumina coating thickness, morphology, and stoichiometry resulting from the preparation method to the oxidation barrier properties, and show that compact and stoichiometric amorphous alumina films offer superior barrier properties.

Item Type:Article
HAL Id:hal-03464232
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Université de Toulouse > Institut National des Sciences Appliquées de Toulouse - INSA (FRANCE)
Université de Toulouse > Institut Supérieur de l'Aéronautique et de l'Espace - ISAE-SUPAERO (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
Other partners > United States Department of Energy (USA)
Université de Toulouse > Université Toulouse - Jean Jaurès - UT2J (FRANCE)
Laboratory name:
Deposited On:04 Mar 2016 11:32

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