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Chemical vapor deposition of low reflective cobalt (II) oxide films

Amin-Chalhoub, Eliane and Duguet, Thomas and Samélor, Diane and Debieu, Olivier and Ungureanu, Elisabeta and Vahlas, Constantin Chemical vapor deposition of low reflective cobalt (II) oxide films. (2016) Applied Surface Science, 360. 540-546. ISSN 0169-4332

(Document in English)

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Official URL: http://dx.doi.org/10.1016/j.apsusc.2015.10.188


Low reflective CoO coatings are processed by chemical vapor deposition from Co2(CO)8at temperatures between 120◦C and 190◦C without additional oxygen source. The optical reflectivity in the visible and near infrared regions stems from 2 to 35% depending on deposition temperature. The combination of specific microstructural features of the coatings, namely a fractal “cauliflower” morphology and a grain size distribution more or less covering the near UV and IR wavelength ranges enhance light scattering and gives rise to a low reflectivity. In addition, the columnar morphology results in a density gradient in the vertical direction that we interpret as a refractive index gradient lowering reflectivity further down.The coating formed at 180◦C shows the lowest average reflectivity (2.9%), and presents an interesting deep black diffuse aspect.

Item Type:Article
Additional Information:Thanks to Elsevier editor. The definitive version is available at http://www.sciencedirect.com The original PDF of the article can be found at Applied Surface Science website : http://www.sciencedirect.com/science/article/pii/S0169433215026070
HAL Id:hal-01264368
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
Laboratory name:
Deposited On:12 Jan 2016 13:32

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