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Fluidized-Bed Chemical Vapor Deposition of Silicon on Very Dense Tungsten Powder

Vanni, Florence and Montaigu, Mélanie and Caussat, Brigitte and Ablitzer, Carine and Iltis, Xavière and Brothier, Méryl Fluidized-Bed Chemical Vapor Deposition of Silicon on Very Dense Tungsten Powder. (2015) Chemical Engineering Technology, 38 (7). 1254-1260. ISSN 1521-4125

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Official URL: http://dx.doi.org/10.1002/ceat.201400350


A very dense tungsten powder was coated by silicon from silane using the fluidized-bed chemical vapor deposition process. A reactor of reduced diameter was developed in order to decrease the weight of powders treated. Results show that the fluidization of this powder is possible in this reactor, but with non-optimal gas solid contact induced by the high powder density. Important disturbances of the fluidized-bed temperatures appeared in the presence of silane, due to a partial bed defluidization related to the cohesive nature of the deposit. These disturbances are clearly exacerbated by the exceptional density of the particles. This is probably why a powder agglomeration has been unavoidable when the bed temperature was too low and/or the silane inlet concentration too high. However, a set of operating parameters could be found, allowing a uniform and continuous coating of the whole powder surface.

Item Type:Article
HAL Id:hal-03464691
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:French research institutions > Commissariat à l'Energie Atomique et aux énergies alternatives - CEA (FRANCE)
French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
Laboratory name:
CEA Cadarache
Deposited On:09 Nov 2015 14:05

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