Causserand, Christel and Rouaix, Sandrine
and Lafaille, Jean-Pierre
and Aimar, Pierre
Ageing of polysulfone membranes in contact with bleach solution: Role of radical oxidation and of some dissolved metal ions.
(2008)
Chemical Engineering and Processing: Process Intensification, 47 (1). 48-56. ISSN 0255-2701
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(Document in English)
PDF (Author's version) - Requires a PDF viewer such as GSview, Xpdf or Adobe Acrobat Reader 419kB |
Official URL: http://dx.doi.org/10.1016/j.cep.2007.08.013
Abstract
In water production plants using membrane processes, contact with chemicals such as chlorine plays an important role in membrane ageing. This experimental study was aimed at gaining a better understanding of the effect of hypochlorite cleaning solutions on the properties of a polysulfone ultrafiltration membrane. Accelerated ageing of the membrane was simulated by soaking it in chlorine solutions and the mechanical properties of the membrane were monitored versus soaking time. An oxidation mechanism is validated which involves the catalytic effect of dissolved metal ions and the inhibitor effect of an antioxidant when these are present in soaking solutions.
Item Type: | Article |
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Additional Information: | Thanks to Elsevier editor. The definitive version is available at http://www.sciencedirect.com The original PDF of the article can be found at Chemical Engineering and Processing: Process Intensification website : http://www.sciencedirect.com/science/journal/02552701 |
HAL Id: | hal-03580178 |
Audience (journal): | International peer-reviewed journal |
Uncontrolled Keywords: | |
Institution: | Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE) Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE) French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE) |
Laboratory name: | Laboratoire de Génie Chimique - LGC (Toulouse, France) - Génie des Interfaces & Milieux Divisés (GIMD) |
Statistics: | download |
Deposited On: | 29 Oct 2008 13:48 |
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