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Fluidized bed as a solid precursor delivery system in a chemical vapor deposition reactor

Vahlas, Constantin and Caussat, Brigitte and Senocq, François and Gladfelter, Wayne L. and Sarantopoulos, Christos and Toro, David and Moersch, Tyler Fluidized bed as a solid precursor delivery system in a chemical vapor deposition reactor. (2005) In: Fifteenth European Conference on Chemical Vapor Deposition, EUROCVD-15, 4 September 2005 - 9 September 2005 (Bochum, Germany).

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Official URL: http://www.electrochem.org/dl/pv/published/2005/2005.htm


Chemical vapor deposition (CVD) using precursors that are solids at operating temperatures and pressures, presents challenges due to their relatively low vapor pressures. In addition, the sublimation rates of solid state precursors in fixed bed reactors vary with particle and bed morphology. In a recent patent application, the use of fluidized bed (FB) technology has been proposed to provide high, reliable, and reproducible flux of such precursors in CVD processes. In the present contribution, we first focus on the reactor design which must satisfy fluidization,sublimation and CVD reactor feeding constraints. Then, we report masstransport results on the sublimation of aluminium acetylacetonate, a common precursor for the CVD of alumina films. Finally, we discuss the efficiency of the precursor feeding rate, we address advantages and drawbacks of the invention and we propose design modifications in order to meet the process requirements.

Item Type:Conference or Workshop Item (Paper)
Additional Information:Thanks to The Electrochemical Society editor.
HAL Id:hal-04038745
Audience (journal):International peer-reviewed journal
Audience (conference):International conference proceedings
Uncontrolled Keywords:
Institution:Université de Toulouse > Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UT3 (FRANCE)
Other partners > University of Minnesota (USA)
French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Laboratory name:
Deposited On:21 Oct 2008 13:26

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