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Items where Institution is :Other partners > Atmel Rousset (FRANCE)

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Nieto, J.-P. and Jeannerot, L and Caussat, Brigitte Modelling of an industrial moving belt chemical vapour deposition reactor forming SiO2 films. (2005) Chemical Engineering Science, vol. 6 (n° 19). 5331 -5340. ISSN 0009-2509

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