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Conformity of aluminum thin films deposited onto micro- patterned silicon wafers by pulsed laser deposition, magnetron sputtering, and CVD

Thomann, Anne-Lise and Vahlas, Constantin and Alaoui, Lyacine and Samélor, Diane and Caillard, Amael and Shaharil, Nurhul and Blanc, Romuald and Millon, Eric Conformity of aluminum thin films deposited onto micro- patterned silicon wafers by pulsed laser deposition, magnetron sputtering, and CVD. (2011) Chemical Vapor Deposition , vol. 17 (n° 10-12). pp. 366-374. ISSN 0948-1907

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Official URL: http://dx.doi.org/10.1002/cvde.201106936

Abstract

Complex materials, exhibiting a cocktail of properties, are currently needed for many applications. In this context, new requirements arise in terms of materials processing, such as the synthesis of sub-micrometer objects, or the coating and functionalization of complex surfaces of powders, porous materials, or micro-patterned devices. Depending on the requirements, the aim may be to duplicate the original design of the surface, or to modify it (filling of holes etc.). Physical vapor deposition (PVD) and CVD are promising techniques for the deposition of thin films on such substrates. In order to compare the ability of various deposition techniques to coat complex surfaces, a micro-patterned silicon wafer has been developed. In the present work, aluminum thin films are deposited on this model substrate by two PVD techniques; pulsed laser deposition (PLD) and magnetron sputtering (MS), and by metal-organic (MO)CVD. Scanning electron microscopy (SEM) is performed in order to determine the microstructure and study the thickness conformity

Item Type:Article
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:French research institutions > Centre National de la Recherche Scientifique - CNRS
Université de Toulouse > Institut National Polytechnique de Toulouse - INPT
Université de Toulouse > Université Paul Sabatier-Toulouse III - UPS
Other partners > Université d'Orléans (FRANCE)
Laboratory name:
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Deposited By:Denis Faragou

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