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MOCVD of hard metallurgical coatings: Examples in the Cr–C–N system

Maury, Francis MOCVD of hard metallurgical coatings: Examples in the Cr–C–N system. (2005) Electrochimica Acta, volume (N° 23). pp. 4525-4530. ISSN 0013-4686

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Official URL: http://dx.doi.org/10.1016/j.electacta.2004.10.088

Abstract

All individual phases of the ternary Cr–C–N system including stable and metastable ones can be deposited at low temperature by metalorganic chemical vapor deposition (MOCVD). These growth processes are mainly based on the use of bis(benzene)chromium as chromium source and various co-reactives. Then, from a good control of the reactive gas phase, it is possible to combine these MOCVD processes to grow in the same reactor protective coatings designed with a complex architecture based on polyphased, nanostructured or multilayer structure which exhibit enhanced properties. These deposition processes are described and the main features of the coatings are discussed.

Item Type:Article
Additional Information:Thanks to Elsevier editor. The definitive version is available at http://www.sciencedirect.com/science?_ob=ArticleURL&_udi=B6TG0-4GFCR14-1&_user=4373306&_coverDate=08%2F25%2F2005&_alid=796037521&_rdoc=1&_fmt=high&_orig=search&_cdi=5240&_sort=d&_docanchor=&view=c&_ct=1&_acct=C000043979&_version=1&_urlVersion=0&_userid=4373306&md5=7669c782bf0457893c92d438d1f0d5c3 ELECTROCHIMICA ACTA website : http://www.elsevier.com/wps/find/journaldescription.cws_home/205/description#description
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution: Université de Toulouse > Institut National Polytechnique de Toulouse - INPT
Université de Toulouse > Université Paul Sabatier-Toulouse III - UPS
French research institutions > Centre National de la Recherche Scientifique - CNRS
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Deposited By: Thomas Bonnecarere
Deposited On:25 Sep 2008 14:40

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