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Decomposition Schemes of Copper(I)N1′-Diisopropylacetamidinate During Chemical Vapor Deposition of Copper

Turgambaeva, Assia and Prud’homme, Nathalie and Krisyuk, Vladislav and Vahlas, Constantin Decomposition Schemes of Copper(I)N1′-Diisopropylacetamidinate During Chemical Vapor Deposition of Copper. (2011) Journal of Nanoscience and Nanotechnology (JNN), vol. 11 (n° 9). pp. 8198-8201. ISSN 1533-4880

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Official URL: http://dx.doi.org/10.1166/jnn.2011.5099

Abstract

Copper(I) N1N′-diisopropylacetamidinate [Cu(amd)]2 (amd = CH(CH352NC(CH35NCH(CH3525, an oxygen and halogen-free compound, was previously tested as precursor for pure copper CVD and ALD films. The present work deals with the investigation of the composition and of the reactivity of the gas phase during the CVD process. The work was performed by mass spectrometry as a function of temperature in two different, though complementary environments: (A) in a miniature, low pressure hot wall CVD reactor, (B) in a cold wall reactor operating at subatmospheric pressure. (A) revealed that the onset of thermal decomposition is 140°C and 130°C in vacuum and in the presence of hydrogen, respectively; maximal decomposition degree is reached at temperature higher than 200°C. The protonated ligand H(amd) is the main gaseous decomposition by-product; propene CH2 CHCH3, acetonitryle CH3C≡N and iminopropane CH3C(CH35 NH are also observed in vacuum. Heterogeneous decomposition mechanism both in vacuum and hydrogen presence is discussed.

Item Type:Article
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:French research institutions > Centre National de la Recherche Scientifique - CNRS
Université de Toulouse > Institut National Polytechnique de Toulouse - INPT
Other partners > Siberian Branch of the Russian Academy of Sciences (RUSSIA)
Université de Toulouse > Université Paul Sabatier-Toulouse III - UPS
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Deposited By: Denis Faragou

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