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Modeling of Silicon CVD into Agglomerates of Sub-micrometersize Particles in a Fluidized Bed

Reuge, Nicolas and Caussat, Brigitte Modeling of Silicon CVD into Agglomerates of Sub-micrometersize Particles in a Fluidized Bed. (2011) Chemical Vapor Deposition, vol. 17 (n° 10-12). pp. 305-311. ISSN 0948-1907

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Official URL: http://dx.doi.org/doi:10.1002/cvde.201106888

Abstract

The aim of the present study is to better understand the mechanisms involved during silicon deposition from silane, SiH4, into agglomerates of sub-micrometer-size particles treated by fluidized bed (FB)CVD. Two models of silicon deposition into agglomerates assumed either stable, or in permanent formation/desegregation, are developed. In the first case, classical equations of diffusion/reaction in a porous medium are solved, whereas in the second case, the multifluid Eulerian code, MFIX, is used. By comparison with experimental energy dispersive X-ray (EDX) data, modeling results show that the limiting step is not gaseous diffusion into the agglomerates. Very high local deposition rates near the silane entrance probably explain their formation. These results allow us to propose original deposition conditions involving much lower local deposition rates, which should limit agglomeration due to CVD.

Item Type:Article
Additional Information:Thanks to Wiley-VCH Verlag Berlin editor. The definitive version of this article is available at :http://dx.doi.org/doi:10.1002/cvde.201106888
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:French research institutions > Centre National de la Recherche Scientifique - CNRS
Université de Toulouse > Institut National Polytechnique de Toulouse - INPT
Université de Toulouse > Université Paul Sabatier-Toulouse III - UPS
Laboratory name:
Laboratoire de Génie Chimique - LGC (Toulouse, France) - Génie des Interfaces & Milieux Divisés (GIMD) - CVD
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Deposited By: Brigitte CAUSSAT-BONNANS
Deposited On:26 Mar 2012 09:06

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