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Deposition of tin oxide, iridium and iridium oxide films by metal-organic chemical vapor deposition for electrochemical wastewater treatment

Klamklang, Songsak and Vergnes, Hugues and Senocq, François and Pruksathorn, Kejvalee and Duverneuil, Patrick and Damronglerd, Somsak Deposition of tin oxide, iridium and iridium oxide films by metal-organic chemical vapor deposition for electrochemical wastewater treatment. (2008) Journal of Applied Electrochemistry, vol. 40 (n° 5). pp. 997-1004. ISSN 0021-891X

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Official URL: http://dx.doi.org/10.1007/s10800-009-9968-1

Abstract

In this research, the specific electrodes were prepared by metal-organic chemical vapor deposition (MOCVD) in a hot-wall CVD reactor with the presence of O2 under reduced pressure. The Ir protective layer was deposited by using (Methylcyclopentadienyl) (1,5-cyclooctadiene) iridium (I), (MeCp)Ir(COD), as precursor. Tetraethyltin (TET) was used as precursor for the deposition of SnO2 active layer. The optimum condition for Ir film deposition was at 300 °C, 125 of O2/(MeCp)Ir(COD) molar ratio and 12 Torr of total pressure. While that of SnO2 active layer was at 380 °C, 1200 of O2/TET molar ratio and 15 Torr of total pressure. The prepared SnO2/Ir/Ti electrodes were tested for anodic oxidation of organic pollutant in a simple three-electrode electrochemical reactor using oxalic acid as model solution. The electrochemical experiments indicate that more than 80% of organic pollutant was removed after 2.1 Ah/L of charge has been applied. The kinetic investigation gives a two-step process for organic pollutant degradation, the kinetic was zero-order and first-order with respect to TOC of model solution for high and low TOC concentrations, respectively.

Item Type:Article
Additional Information:Thanks to Springer editor. The definitive version is available at http://www.springerlink.com/ The original PDF of the article can be found at Journal of Applied Electrochemistry website :http://www.springerlink.com/content/57042l3j428022v5/
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:French research institutions > Centre National de la Recherche Scientifique - CNRS
Other partners > Chulalongkorn University (THAILAND)
Université de Toulouse > Institut National Polytechnique de Toulouse - INPT
Université de Toulouse > Université Paul Sabatier-Toulouse III - UPS
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Deposited By: Leila Abdelouhab

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