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Chemical vapour deposition and atomic layer deposition of amorphous and nanocrystalline metallic coatings: towards deposition of multimetallic films

Blanquet, Elisabeth and Mantoux, Arnaud and Pons, Michel and Vahlas, Constantin Chemical vapour deposition and atomic layer deposition of amorphous and nanocrystalline metallic coatings: towards deposition of multimetallic films. (2010) Journal of Alloys and Compounds, vol. 504 (Suppl. 1). S422-S424. ISSN 0925-8388

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Official URL: http://dx.doi.org/10.1016/j.jallcom.2010.03.205

Abstract

This paper provides a prospective insight on chemical vapour deposition (CVD) and atomic layer deposition (ALD) as dry techniques for the processing of amorphous and nanocrystalline metallic thin films. These techniques are part of major technologies in application fields such as microelectronics, energy, or protective coatings. From thermodynamic analysis, areas of investigation to generate a set of materials with the strongest propensity for amorphization as well as useful guidelines for the target phase material deposition are provided. Prospective to develop MOCVD (metalorganic chemical vapour deposition) and ALD of intermetallic films, in view of fabrication of metallic glass thin films is proposed. Examples from selected ALD and MOCVD single element metallic deposition processes will be described to illustrate the effect of deposition parameters on the physico-chemical properties of the films. This processing approach is particularly promising for metallic glass thin films.

Item Type:Article
Additional Information:Thanks to Elsevier editor. The definitive version is available at http://www.sciencedirect.com The original PDF of the article can be found at Journal of Alloys and Compounds website : http://www.sciencedirect.com/science/journal/09258388
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:French research institutions > Centre National de la Recherche Scientifique - CNRS
Université de Toulouse > Institut National Polytechnique de Toulouse - INPT
Other partners > Institut National Polytechnique de Grenoble (FRANCE)
Université de Toulouse > Université Paul Sabatier-Toulouse III - UPS
Other partners > Université Joseph Fourier Grenoble 1 - UJF (FRANCE)
Laboratory name:
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Deposited By: Leila Abdelouhab

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