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Chemical vapor deposition of TiO2 for photocatalytic applications and biocidal surfaces

Maury, Francis and Mungkalasiri, Jitti Chemical vapor deposition of TiO2 for photocatalytic applications and biocidal surfaces. (2009) Key Engineering Materials, vol. 415. pp. 1-4. ISSN 1662-9795

(Document in English)

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Official URL: http://dx.doi.org/10.4028/www.scientific.net/KEM.415.1


Through a few examples, we present a short review on properties and applications of TiO2 films deposited by various CVD processes. The constraints due to the growth process make difficult optimization of properties that were correlated with microstructures. We focus on the photocatalytic activity in the visible range and on the antibacterial behavior of these functional thin layers.

Item Type:Article
Additional Information:Thanks to Trans Tech Publications editor. The definitive version is available at http://www.ttp.net/ The original PDF of the article can be found at Key Engineering Materials website : http://www.scientific.net/KEM.415.1
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:Université de Toulouse > Institut National Polytechnique de Toulouse - INPT (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UPS (FRANCE)
French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Laboratory name:
Deposited By: Nihad Lahdifi
Deposited On:21 Feb 2011 17:27

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