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Chemical vapor deposition and characterization of nitrogen doped TiO2 thin films on glass substrates

Sarantopoulos, Christos and Gleizes, Alain and Maury, Francis Chemical vapor deposition and characterization of nitrogen doped TiO2 thin films on glass substrates. (2009) Thin Solid Films, vol. 518 (n° 4). 1299-1303 . ISSN 0040-6090

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Official URL: http://dx.doi.org/10.1016/j.tsf.2009.04.070

Abstract

Photocatalytically active, N-doped TiO2 thin films were prepared by low pressure metalorganic chemical vapor deposition (MOCVD) using titanium tetra-iso-propoxide (TTIP) as a precursor and NH3 as a reactive doping gas. We present the influence of the growth parameters (temperature, reactive gas phase composition) on the microstructural and physico-chemical characteristics of the films, as deduced from X-ray diffraction (XRD), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), secondary ion mass spectrometry (SIMS) and ultra-violet and visible (UV/Vis) spectroscopy analysis. The N-doping level was controlled by the partial pressure ratio R=[NH3]/[TTIP] at the entrance of the reactor and by the substrate temperature. For R=2200, the N-doped TiO2 layers are transparent and exhibit significant visible light photocatalytic activity (PA) in a narrow growth temperature range (375–400 °C). The optimum N-doping level is approximately 0.8 at.%. However, the PA activity of these N-doped films, under UV light radiation, is lower than that of undoped TiO2 films of comparable thickness.

Item Type:Article
Additional Information:Thanks to Elsevier editor. The definitive version is available at http://www.sciencedirect.com The original PDF of the article can be found at Thin Solid Films website : http://www.sciencedirect.com/science/journal/00406090
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution: Université de Toulouse > Institut National Polytechnique de Toulouse - INPT
Université de Toulouse > Université Paul Sabatier-Toulouse III - UPS
French research institutions > Centre National de la Recherche Scientifique - CNRS
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Deposited By: Nihad Lahdifi
Deposited On:13 Dec 2010 14:43

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